| 摘要 |
A micro-processing method is provided for forming a structure adapted to confine electrons within a micro-region. The method comprises steps of arranging a probe oppositely relative to a non-electroconductive thin film arranged on an electroconductive substrate, placing the probe on or near the surface to be processed of the non-electroconductive thin film, applying a voltage between the probe and the substrate to form an enhanced electroconductivity region as compared with the remaining area in the non-electroconductive thin film, and oxidizing the interface of the substrate and the non-electroconductive thin film.
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