| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To achieve sufficient polishing speed while suppressing generation of scratches. Ž<P>SOLUTION: An average particle diameter of polishing particles is 5-200 nm, specifically preferable in 10-120 nm. The polishing particles have 500-4500 N/mm<SP>2</SP>of a 10% compression elastic modulus, specifically preferable in 1000-4000 N/mm<SP>2</SP>. In the case that the 10% compression elastic modulus is less than 500 N/mm<SP>2</SP>, the polishing particles are too soft not to obtain a sufficient polishing speed. In the case that it exceeds 4500 N/mm<SP>2</SP>, the particles are too hard, the polishing speed is fast, the scratches residually exist, and newly generate, so smoothness of a polishing face is insufficient. Ž<P>COPYRIGHT: (C)2004,JPO&NCIPI Ž</p> |
