| 摘要 |
PROBLEM TO BE SOLVED: To provide a transfer apparatus, a substrate processing apparatus, and a substrate processing system where the position can be easily detected and maintenance can be facilitated. SOLUTION: A cleaning apparatus 11 comprises a cleaning tank 30 for cleaning a wafer W, a wafer guide 31 that moves vertically to hold the wafer W and make the wafer W stored in the clean tank, a motor 32 to make the wafer guide 31 move vertically, and an absolute encoder 33, a driver 62, and a controller 63 for detecting the position of the wafer guide 31. The absolute encoder 33 detects the rotation angle of the rotating shaft 53 of a motor 49, and then a detected signal is output in a driver 62, and then the driver 62 detects the position of the wafer guide 31 on the basis of this detected signal, and thus the position information about the wafer guide 31 is outputted to the controller 63. |
