Exposure apparatus

摘要

An optical element (4) is used for an exposure apparatus which is configured to illuminate a mask (R) with an exposure light beam (IL) for transferring a pattern on the mask onto a substrate (W) through a projection optical system (PL) and to interpose a given liquid (7) in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member (F1,F2) provided on a surface (4A) of a transmissive optical element on the substrate's side of the projection optical system.