| 发明名称 |
Positive-working resist composition |
| 摘要 |
<p>A positive-working resist composition is provided which comprises a compound capable of generating a fluorine-containing sulphonic acid by irradiation and a resin which contains repeating units of certain specific formulae and which increases the solubility in an alkali developing solution by the action of an acid.</p> |
| 申请公布号 |
EP2278399(A2) |
申请公布日期 |
2011.01.26 |
| 申请号 |
EP20100188667 |
申请日期 |
2003.06.02 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
MIZUTANI, KAZUYOSHI;KANNA, SHINICHI;SASAKI, TOMOYA |
| 分类号 |
G03F7/039;G03F7/004 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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