Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same

摘要

A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F atom, and increasing a contact angle on a surface of the topcoat film; and (C) a solvent.