| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that is takes a long time for exposure when manufacturing a rugged die for manufacturing a computer hologram, particularly when photo-etching in conventional technique. SOLUTION: A computer hologram 1 is set as an array of minute element holograms 2 with mutually the same phase distribution, and the calculation of rugged depth from the phase distribution and burden on a plotter during the exposure at the photo-etching are reduced to reduce the exposure time. |
