发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of detecting a working terminal point without deteriorating a polishing characteristic. <P>SOLUTION: A through hole 3 to detect the working terminal point is provided so that a cross-section shape in the polishing direction is elliptical and the major axis direction is in parallel with the radial direction of the polishing pad 1, and a non-working part 4 on which a recessing work is not applied is provided on a peripheral part of this through hole 3. It is desirable that a major axis (a) is 4 to 8 mm and that a minor axis (b) is 3 to 5 mm as size of the through hole 3. It is desirable that a diameter (d) is 15 to 60 mm as size of the non-working part 4. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP4620501(B2) 申请公布日期 2011.01.26
申请号 JP20050060911 申请日期 2005.03.04
申请人 发明人
分类号 B24B37/013;B24B37/20;H01L21/304 主分类号 B24B37/013
代理机构 代理人
主权项
地址