| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which ensures less lowering of sensitivity, can resolve a fine contact hole pattern, and attains various good resist performances such as its roundness and pattern shape. <P>SOLUTION: The chemically amplified positive resist composition comprises a resin which contains a polymerized unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound shown by formula (C-1) wherein R<SP>1</SP>and R<SP>2</SP>each independently represents H or a 1-4C alkyl which may be branched; and R<SP>3</SP>-R<SP>5</SP>each independently represents H or hydroxyl. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
