发明名称 |
Semiconductor pressure sensor and method of manufacturing the same |
摘要 |
<p>A semiconductor pressure sensor includes a single crystal silicon substrate; a diaphragm formed in the single crystal silicon substrate by etching the single crystal silicon substrate from a back surface side thereof; four diaphragm side walls enclosing the diaphragm; and a bridge circuit formed on a surface of the single crystal silicon substrate, the bridge circuit including a lead conductor and a strain gauge resistor. The bridge circuit is configured to detect a pressure applied to the semiconductor pressure sensor based on a change in an output value of the bridge circuit that corresponds to an amount of flexure produced in the diaphragm by the pressure. The diaphragm has a plane orientation in a (110) plane and a parallelogram in-plane shape. The four diaphragm side walls have a plane orientation in a (111) plane and form two pairs of parallel and opposite surfaces.</p> |
申请公布号 |
EP2278293(A1) |
申请公布日期 |
2011.01.26 |
申请号 |
EP20100157321 |
申请日期 |
2010.03.23 |
申请人 |
IBIDEN CO., LTD. |
发明人 |
MIYATA, FUMISHIGE;INAGAKI, SHINJI;HAMANAKA, SENJI |
分类号 |
G01L9/06 |
主分类号 |
G01L9/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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