| 发明名称 |
Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same |
| 摘要 |
An insulating-film-forming composition includes: a hydrolysis-condensation product obtained by hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C); and an organic solvent.
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| 申请公布号 |
US7875317(B2) |
申请公布日期 |
2011.01.25 |
| 申请号 |
US20060486085 |
申请日期 |
2006.07.14 |
| 申请人 |
JSR CORPORATION |
发明人 |
NAKAGAWA HISASHI;AKIYAMA MASAHIRO;KUROSAWA TAKAHIKO;SHIOTA ATSUSHI |
| 分类号 |
B05D3/02;C08G77/42;C08G77/48;C08L83/04;C08L83/14;C08L83/16;C09D183/14;H01B3/30;H01B3/46;H01L21/312 |
主分类号 |
B05D3/02 |
| 代理机构 |
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代理人 |
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