TRANSPARENT THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF
摘要
<p>PURPOSE: A transparent thin film transistor and a fabrication method thereof are provided to a process time and costs by lowering a temperature at which a thin film is generated. CONSTITUTION: A gate electrode, a source electrode, and a drain electrode provide a transparent thin film transistor such as transparent electrode in a solution process. The electrodes are a complex In-oxide precursor including Zn or Sn. If the electrodes include Zn, the composition ratio is between 34:66 mol% ~ 14:86 mol% of Zn and In and If including Sn, the composition ratio is between 20:80 mol% ~ 1:99 mol% of Sn and In.</p>
申请公布号
KR20110007680(A)
申请公布日期
2011.01.25
申请号
KR20090065235
申请日期
2009.07.17
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
发明人
MOON, JOO HO;SONG, KEUN KYU;JUN, TAE HWAN;KOO, CHANG YOUNG;JEONG, YOUNG MIN;KIM, DONG JO;KIM, BUM KI