发明名称 APPARATUS FOR CLEANING SUBSTRATE
摘要 PURPOSE: An apparatus for cleaning a substrate is provided to prevent air leakage by combining a porous cleaning plate with a manifold through an insert block. CONSTITUTION: A substrate is entered into a substrate entry guide portion from outside. An impurity removing unit removes foreign material formed in a substrate supplied from the substrate entry guide portion. A foreign material cleaning unit washes away the foreign material remaining in the substrate provided from the impurity removing unit. A position controller controls the location of the substrate carried out from the foreign material cleaning unit. The foreign material cleaning unit comprises an insert block(250), a porous cleaning plate, and a manifold(201). The joint holes are formed in the insert block.
申请公布号 KR20110007888(A) 申请公布日期 2011.01.25
申请号 KR20090065559 申请日期 2009.07.17
申请人 MMT CO., LTD.;LG DISPLAY CO., LTD. 发明人 LEE, EUN HA;CHOI, YOUNG SEOK;LEE, JAE JUNG
分类号 H01L21/302;G02F1/13 主分类号 H01L21/302
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