发明名称 Methods of fabricating MEMS devices having overlying support structures
摘要 Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
申请公布号 US7875485(B2) 申请公布日期 2011.01.25
申请号 US20090510046 申请日期 2009.07.27
申请人 QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 SASAGAWA TERUO;GANTI SURYAPRAKASH;MILES MARK W.;CHUI CLARENCE;KOTHARI MANISH;TUNG MING-HAU
分类号 H01L21/00 主分类号 H01L21/00
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