METHOD FOR Nitride FILM producing

摘要

A method for nitride film producing includes titanium target sputtering. Then the modified coating is formed. At that as a polycrystalline substrate the substrate of structural steel VSt3sp is used. Before the implantation a negative potential is submitted and the system is energized. Simultaneously the voltage is supplied to the target. At that the dispersed titanium ions beaten from the target penetrate into the steel substrate.