发明名称 NOVEL COMPOUND, POLYMER AND RADIATION-SENSITIVE COMPOSITION
摘要 A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
申请公布号 KR20110008088(A) 申请公布日期 2011.01.25
申请号 KR20107025830 申请日期 2009.05.18
申请人 JSR CORPORATION 发明人 SAKAKIBARA HIROKAZU;NARUOKA TAKEHIKO;SHIMIZU MAKOTO;NISHIMURA YUKIO;MATSUMURA NOBUJI;ASANO YUUSUKE
分类号 C07C69/96;C08F20/28;G03F7/039;H01L21/027 主分类号 C07C69/96
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