| 摘要 |
According to an embodiment, an apparatus for measuring the uniformity of a beam of charged particles at an exposure location includes a plurality of Faraday cups, each cup including an electrometer for determining the current collected by said cup, at least one multi-channel low current scanner card electrically coupled to the electrometers, a processor electrically coupled to said at least one scanner card, computational analysis software for receiving signals from said processor and calculating beam parameters, and display software for generating a graphical representation of the beam parameters calculated by said computational analysis software.
|
