发明名称 |
APPARATUS FOR MANUFACTURING SEMICONDUCTOR |
摘要 |
PURPOSE: A semiconductor manufacturing device is provided to simultaneously process a great number of wafers than a conventional vertical furnace. CONSTITUTION: A tube has a process space inside. The tube has a vent(103) on one side. A boat goes in and out through the lower aperture of the tube. A nozzle(140a) is formed in order to horizontally spray process gas. After a susceptor is loaded, a boat is inserted into the tube. The tube is heated to maintain the internal temperature of the tube at setting temperature.
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申请公布号 |
KR20110007434(A) |
申请公布日期 |
2011.01.24 |
申请号 |
KR20090064952 |
申请日期 |
2009.07.16 |
申请人 |
ATTO CO., LTD. |
发明人 |
RYU, SEON HO;PARK, SANG JOON;KIM, YOUNG JUN |
分类号 |
H01L21/22 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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