发明名称 APPARATUS FOR MANUFACTURING SEMICONDUCTOR
摘要 PURPOSE: A semiconductor manufacturing device is provided to simultaneously process a great number of wafers than a conventional vertical furnace. CONSTITUTION: A tube has a process space inside. The tube has a vent(103) on one side. A boat goes in and out through the lower aperture of the tube. A nozzle(140a) is formed in order to horizontally spray process gas. After a susceptor is loaded, a boat is inserted into the tube. The tube is heated to maintain the internal temperature of the tube at setting temperature.
申请公布号 KR20110007434(A) 申请公布日期 2011.01.24
申请号 KR20090064952 申请日期 2009.07.16
申请人 ATTO CO., LTD. 发明人 RYU, SEON HO;PARK, SANG JOON;KIM, YOUNG JUN
分类号 H01L21/22 主分类号 H01L21/22
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