METHOD OF MANUFACTURING HF FILMS WITH IMPROVED UNIFORMITY IN METAL ORGANIC CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A metal organic chemical deposition method is provided to improve the uniformity of a layer by properly controlling the evaporation temperature of LDS. CONSTITUTION: A source gas is supplied to a chamber through a LDS(Liquid Delivery System) where evaporation temperature is 150° to 200°. A diluent dilutes the source gas or reaction gas. The diluent uses inactive gas or nitrogen gas. The reaction gas is oxygen gas or ozone gas.