发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PURPOSE: A substrate processing device is provided to improve energy efficiency and a substrate temperature property. CONSTITUTION: An entrance transfers a substrate(G) to the inside before a process. An exit takes out the substrate to the outside after a process. A heating part is arranged along a transfer path in order to heat the substrate at predetermined temperature. A cassette station(C/S)(14) is the cassette transfer port of a system(10).</p>
申请公布号 KR20110007045(A) 申请公布日期 2011.01.21
申请号 KR20100067385 申请日期 2010.07.13
申请人 TOKYO ELECTRON LIMITED 发明人 OBARU TAKANORI
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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