发明名称 PLASMA GENERATING APPARATUS, AND REMOTE PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a small-sized plasma generating apparatus with high plasma excitation efficiency.SOLUTION: This plasma generating apparatus 100 includes a microwave generating device 10 for generating a microwave, a slot antenna 21b to radiate the microwave generated by the microwave generating apparatus 10, a coaxial waveguide 20 having a coaxial structure composed of an inner tube 20a and an outer tube 20b to guide the microwave generated by the microwave generating device 10 to the slot antenna 21b mounted to one end of the inner tube 20a, a resonator 22 made of a dielectric material to support the slot antenna 21b, and a chamber 23 for plasma excitation, which has an open surface for the resonator 22 to be disposed, to which the microwave radiated from the slot antenna 21b through the resonator 22 is guided and a prescribed process gas is supplied, and in which the process gas is excited by the microwave.
申请公布号 JP2011014542(A) 申请公布日期 2011.01.20
申请号 JP20100171739 申请日期 2010.07.30
申请人 TOKYO ELECTRON LTD 发明人 KASAI SHIGERU
分类号 H05H1/46;H01L21/205;H01L21/3065 主分类号 H05H1/46
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