SUBSTRATE PROCESSING APPARATUS AND METHOD, AND IN-LINE PROCESSING SYSTEM AND METHOD COMPRISING THE SAME

摘要

PURPOSE: A substrate processing apparatus, a method thereof, and an inline process system having the same, and a method thereof are provided to improve the productivity by shortening the process time by continuously processing the substrate. CONSTITUTION: A chamber(131) comprises the internal space. A transfer unit(141) supplies a cart(110) into the chamber or discharges the cart out of the chamber. A heating unit(151) heats a substrate(S) settled on the upper side. An elevating unit(161) raises or drops the substrate supplied into the chamber. The elevating unit comprises a plurality of lift pins(162).