METHOD FOR ROUGHENING SUBSTRATE SURFACE, METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE, AND PHOTOVOLTAIC DEVICE

摘要

Involved are a first process for forming a protective film upon the surface of a translucent substrate; a second process for exposing the surface of the translucent substrate by forming a plurality of openings in the protective film that are regularly arranged at a constant pitch; a third process for performing isotropic etching, using the protective film with openings as a mask, on the surface of the translucent substrate upon which the protective film is formed, under conditions in which the protective film exhibits resistance, and for forming uneven parabola shapes in which depressions having a roughly hemispheric shape are disposed upon the surface of the translucent substrate in an approximately uniform manner; and a fourth process for removing the protective film. In the fourth process, isotropic etching is continued after the formation of the uneven parabola shapes, and the protective film is separated from the translucent substrate while the tips of protruding sections in the uneven parabola shapes are rounded.