发明名称 |
METHOD FOR MANUFACTURING MICROLENS ARRAY AND PHOTOMASK |
摘要 |
PROBLEM TO BE SOLVED: To reduce the manufacturing variation of inter-lens gap of a microlens array in which the gap between the lenses in the oblique direction is ≤0.2 μm.SOLUTION: A method for manufacturing a microlens array includes: a first step in which first microlenses arranged in a grid are formed by exposing and developing a first photomask pattern on a photosensitive lens material layer; and a second step in which second microlenses formed from a grid of microlenses not selected in the first step are formed by exposing and developing a second photomask pattern on the photosensitive lens material layer. The microlens array is manufactured on the first photomask by using a photomask having: an octagonal light shield pattern; a belt-like gap pattern located at intervals in the oblique direction of the light shield pattern and having 100% light transmissivity; and a translucent section, which is an area other than the light shielding pattern and belt-like interval pattern and is translucent. |
申请公布号 |
JP2011013411(A) |
申请公布日期 |
2011.01.20 |
申请号 |
JP20090156656 |
申请日期 |
2009.07.01 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
ASAO YOSHIKAZU;KITAMURA TOMOHITO |
分类号 |
G02B3/00;H01L27/14;H04N5/335 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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