发明名称 METHOD FOR MANUFACTURING MICROLENS ARRAY AND PHOTOMASK
摘要 PROBLEM TO BE SOLVED: To reduce the manufacturing variation of inter-lens gap of a microlens array in which the gap between the lenses in the oblique direction is ≤0.2 μm.SOLUTION: A method for manufacturing a microlens array includes: a first step in which first microlenses arranged in a grid are formed by exposing and developing a first photomask pattern on a photosensitive lens material layer; and a second step in which second microlenses formed from a grid of microlenses not selected in the first step are formed by exposing and developing a second photomask pattern on the photosensitive lens material layer. The microlens array is manufactured on the first photomask by using a photomask having: an octagonal light shield pattern; a belt-like gap pattern located at intervals in the oblique direction of the light shield pattern and having 100% light transmissivity; and a translucent section, which is an area other than the light shielding pattern and belt-like interval pattern and is translucent.
申请公布号 JP2011013411(A) 申请公布日期 2011.01.20
申请号 JP20090156656 申请日期 2009.07.01
申请人 TOPPAN PRINTING CO LTD 发明人 ASAO YOSHIKAZU;KITAMURA TOMOHITO
分类号 G02B3/00;H01L27/14;H04N5/335 主分类号 G02B3/00
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