| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for detecting a position, the method improving detection accuracy in performing alignment between a substrate and a photomask using an alignment mark.SOLUTION: In a method for detecting a position, a resist is applied on a substrate including an alignment mark formed therein in which the inside of the alignment mark is divided by a step with the outside, light for detecting alignment is radiated on the substrate; and a change of a reflection light intensity, caused due a difference in a coating film thickness of the resist at the center and the end inside the alignment mark, is observed to detect the position of the alignment mark. The coating film thickness of the resist is adjusted so that a reflection light intensity at the center inside the alignment mark is stronger than that at the end inside the alignment mark. |
