发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent increase of off-current by formation of a defect in junction between a channel formation region and an impurity region in a p-channel type TFT when making structures of TFTs arranged in a display region and a drive circuit of a semiconductor device appropriate in accordance with a function.SOLUTION: In this semiconductor device where a first n-channel type TFT is arranged in a display region and a second n-channel type TFT and a p-channel type TFT are arranged in a drive circuit, the p-channel type TFT includes a channel formation region and an impurity region adjacent to it, wherein an impurity element added for the n-channel type TFT is not included in the impurity region. Thus, the channel length of the p-type channel type TFT is set smaller than that of the n-channel type TFT.
申请公布号 JP2011014930(A) 申请公布日期 2011.01.20
申请号 JP20100226258 申请日期 2010.10.06
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 KITAKADO HIDETO;KAWASAKI RITSUKO;KASAHARA KENJI
分类号 H01L29/786;G02F1/1362;G02F1/1368;H01L21/336;H01L27/12 主分类号 H01L29/786
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