TARGET BACKING TUBE, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM
摘要
<p>The present application concerns a target backing tube (122) for a rotatable cylindrical target assembly (120) comprising: a tube (122) for at least one target element (126) to be disposed there around, wherein the tube has an exterior surface adapted to be directed to the at least one target element; and a thermal reflection cover (128) covering a portion of at least 20% of the exterior surface of the tube. Further, the present application concerns a rotatable cylindrical target assembly comprising: said target backing tube and at least one target element disposed around the target backing tube, wherein the thermal reflection cover disposed between the target backing tube and the at least one target element.</p>
申请公布号
WO2011006801(A1)
申请公布日期
2011.01.20
申请号
WO2010EP59658
申请日期
2010.07.06
申请人
APPLIED MATERIALS, INC.;SCHNAPPENBERGER, FRANK;WEBER, ROLAND;KREMPEL-HESSE, JOERG;HELLMICH, ANKE
发明人
SCHNAPPENBERGER, FRANK;WEBER, ROLAND;KREMPEL-HESSE, JOERG;HELLMICH, ANKE