| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that a high-temperature region and a low-temperature region are formed on a shower plate due to an influence of a heating region of a substrate-heating heater, a flaky product that easily exfoliates is formed on the surface of the shower plate at the low-temperature region (non-heated region) in an outer peripheral portion of the shower plate, and the product deposits on a substrate to be treated as a contaminant and causes the deterioration of the quality and uniformity of the film.SOLUTION: This vapor deposition apparatus is constituted by: arranging a space in the outside of a region of the shower plate opposing to a substrate-holding member and in the contacting face between a shower head and the shower plate; and providing a plurality of through-holes that communicate with the inside of a reaction chamber, in a region part in which the space of the shower plate has been arranged, and that introduce a purge gas to the reaction chamber therethrough. Therefore, the apparatus can pass a source gas which exists on the surface of the shower plate in the non-heated region, toward a gas exhaust port side, and further can make a stagnant region hardly formed at a corner. Thus, the apparatus reduces the product to be formed on the surface of the shower plate, and secures the uniformity and reproducibility of the film on the substrate to be treated. |
