发明名称 METHOD OF CONSTRUCTING BASE ISOLATING STRUCTURE, AND TEMPORARY SUPPORTING STRUCTURE FOR BASE ISOLATING DEVICE
摘要 PROBLEM TO BE SOLVED: To secure levelness of an upper skeleton and a base isolating device; and to reduce the construction period.SOLUTION: A method of constructing the base isolating structure includes: a column supporting base installation process to install, on a floor slab 3, a column supporting base 10 provided with a level adjusting mechanism 14 performing level adjustment of an upper surface; a column base installation process to install a column base 50 fitted with the base isolating device 2 on an upper surface of the column supporting base 10; a column base level adjusting process to adjust the levelness of the column base 50 by adjusting the level of the upper surface of the column supporting base 10 by using the level adjusting mechanism 14 of the column supporting base 10; a base isolation foundation construction process to place the concrete under the base isolating device 2 and construct the base isolation foundation 30; and a base isolating device fixing process to fix the base isolating device 2 to the base isolation foundation 30.
申请公布号 JP2011012464(A) 申请公布日期 2011.01.20
申请号 JP20090157694 申请日期 2009.07.02
申请人 TAISEI CORP 发明人 ISE HIROSHI;SUDA NAONORI;KITAMURA KIMINAO
分类号 E04H9/02;F16F15/04 主分类号 E04H9/02
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