| 摘要 |
An exposure apparatus according to an exemplary embodiment of the invention includes a substrate in which plural light-emitting devices are arrayed one-dimensionally or two-dimensionally; and a hologram recording layer that is disposed on the substrate, plural holograms being recorded in the hologram recording layer by holographic interference between a first beam and a second beam such that a predetermined number of beam spots are disposed in the hologram recording layer in a predetermined array direction according to a portion of light-emitting devices, the portion of light-emitting devices being selected as emitters from the plural light-emitting devices, the beam spot being formed by a light beam of the second beam, the first beam passing through an optical path of diffusion light that passes through the emitter, the second beam passing through an optical path of convergent light that converges at a predetermined distance outside the optical path of the first beam.
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