PURPOSE: An apparatus for generating plasma is provided to reduce damage generated on a substrate to be plasma processed by forming dielectrics in proper thicknesses according to the kinds of dielectrics. CONSTITUTION: An electrode(10) includes a power supplying electrode(11) and a grounded ground electrode(12). The power supplying electrode is obtained power from a separate power supply unit(40). Glow discharge is generated between two electrodes by a voltage applied between the electrodes. A substrate to be plasma processed is introduced in a glow discharge generated part, the substrate is plasma processed.
申请公布号
KR20110006203(A)
申请公布日期
2011.01.20
申请号
KR20090063723
申请日期
2009.07.13
申请人
GLOBAL TECHNOLOGY VIDEO CO., LTD.
发明人
MOON, CHEOL HEE;KWON, HYE KYONG;LEE, KANG JIN;LEE, HYUNG JOO;PARK, GWANG MOON;BAE, HAN SUNG