| 摘要 |
PROBLEM TO BE SOLVED: To properly correct a spherical aberration of a projection optical system, and to transfer the pattern of a mask correctly onto a photosensitive substrate.SOLUTION: An exposure device, which carries out projection exposure of the pattern of a mask (M) onto the photosensitive substrate (W) via a projection optical system (PL), includes a mask stage (MS) which holds the mask movably in the direction of the optical axis (AX); an optical path length variable member (1) which has a medium part, being located near the mask in the optical path of the projection optical system and consisting of a medium having a refractive index different from that of the gas in the optical path and changes the optical path length along the direction (Z direction) parallel with the optical axis of the medium part; and a control unit (CR) which interlocks the change in the optical path length of the medium part in the optical path length variable member with the movement of the mask stage in the direction of the optical axis for correcting the higher order spherical aberrations of the projection optical system. |
