发明名称 METHOD FOR MANUFACTURING STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure by which an efficient film is formed by suppressing the occurrence of etching on a base body.SOLUTION: In the method for manufacturing a film-like structure 10 by blowing aerosol 4 in which particles 3 and gas 1 are mixed with each other on the base body 9 from an exit of a nozzle 8 at high speed, the aerosol 4 suppresses etching of the film-like structure 10 by changing the speed of at least etching particles with higher etching effect out of the particles 3 by a speed changing means 11 provided on at least a projection area of the exit of the nozzle 8 between the nozzle 8 and the base body 9.
申请公布号 JP2011012319(A) 申请公布日期 2011.01.20
申请号 JP20090158740 申请日期 2009.07.03
申请人 PANASONIC CORP 发明人 HAMANO TAKASHI;GYOTOKU AKIRA
分类号 C23C24/04 主分类号 C23C24/04
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