发明名称 FLOW CONTROL FEATURES OF CVD CHAMBERS
摘要 Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.
申请公布号 US2011011338(A1) 申请公布日期 2011.01.20
申请号 US20100836726 申请日期 2010.07.15
申请人 APPLIED MATERIALS, INC. 发明人 CHUC KIEN N.;LIANG QIWEI;NGUYEN HANH D.;CHEN XINGLONG;MILLER MATTHEW;PARK SOONAM;TRAN TOAN Q.;KHAN ADIB;YANG JANG-GYOO;LUBOMIRSKY DMITRY;VENKATARAMAN SHANKAR
分类号 C23C16/00 主分类号 C23C16/00
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