POSITIVE TYPE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINED HIGH MOLECULAR COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a resist composition preferable for immersion exposure or alkali development, and also to provide a method of forming a resist pattern using the resist composition, and a fluorine-contained high molecular compound useful as an additive used in the resist composition.SOLUTION: This positive type resist composition contains: a fluorine-contained high molecular compound (F) containing a structural unit (f1) having decomposition property to an alkali liquid developer as a block copolymerization part ; a base material component (A) increased in solubility to the alkali liquid developer by action of acid; and an acid generating agent component (B) adapted to generate an acid by exposure.