| 摘要 |
PROBLEM TO BE SOLVED: To accurately correct a change in imaging characteristics of a projection optical system, the change being attributed to a change in environment condition in the projection optical system.SOLUTION: An exposure method includes: a calculation step of calculating a correction amount of a correction part which corrects a change in imaging characteristics of the projection optical system based on at least one of parameters selected from a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern of a mask, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step. |
