发明名称 METHOD OF MANUFACTURING SUBSTRATE FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently manufacture a substrate for a semiconductor substrate with high reliability by suppressing the warpage of, for example, a glass substrate.SOLUTION: A method of manufacturing the substrate for the semiconductor device includes a sticking process of arranging and sticking a first element substrate (200a) and a second element substrate (200b) via adhesives (500) interposed therebetween so that a surface of a first substrate (20a) where a first semiconductor element (30a) is formed and a surface of a second substrate (20b) where a second semiconductor element (30b) is formed are opposed to each other, and a plate thinning process of performing plate thinning processing on a surface of the first substrate where the first semiconductor element is not formed and a surface of the second substrate where the second semiconductor element is not formed after the sticking process. Furthermore, the method of manufacturing the substrate for the semiconductor device includes a support substrate sticking process of sticking support substrates (11) on the first and second substrates, respectively, and a separating process of separating the first and second element substrates from each other by peeling the adhesives from the first and second substrates.
申请公布号 JP2011014780(A) 申请公布日期 2011.01.20
申请号 JP20090158842 申请日期 2009.07.03
申请人 SEIKO EPSON CORP 发明人 KANEDA KOJI
分类号 H01L21/02;H01L21/336;H01L25/04;H01L25/18;H01L27/00;H01L27/12;H01L29/786 主分类号 H01L21/02
代理机构 代理人
主权项
地址