发明名称 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
摘要 A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.
申请公布号 US2011014566(A1) 申请公布日期 2011.01.20
申请号 US20100833457 申请日期 2010.07.09
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 ICHIKAWA KOJI;SUGIHARA MASAKO;YAMASHITA YUKO
分类号 G03F7/20;C07C57/03;C07C63/64;C07C69/753;C08F24/00;C08F32/08;G03F7/004 主分类号 G03F7/20
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