发明名称 |
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME |
摘要 |
A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation. |
申请公布号 |
US2011014566(A1) |
申请公布日期 |
2011.01.20 |
申请号 |
US20100833457 |
申请日期 |
2010.07.09 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ICHIKAWA KOJI;SUGIHARA MASAKO;YAMASHITA YUKO |
分类号 |
G03F7/20;C07C57/03;C07C63/64;C07C69/753;C08F24/00;C08F32/08;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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