RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which is excellent in adhesion of a resist film to a substrate or the like, and suppresses pattern collapse, and also to provide a resist pattern forming method.SOLUTION: The resist composition contains: a base component (A) the solubility of which in an alkali developer changes by the action of an acid; an acid generator component (B) which generates an acid upon exposure; and an epoxy resin (G). The resist pattern forming method includes the steps of: forming a resist film on a support by using the resist composition; exposing it; and alkali developing it to form a resist pattern.