发明名称 ELECTROLYTIC HARD GOLD PLATING SOLUTION AND PLATING METHOD OF USING THE SAME
摘要 PURPOSE: A hardened gold plating liquid, capable of suppressing a plated layer on besides a plating section, and a plating method using the same, is provided to install a Ni barrier layer on a small sized connector. CONSTITUTION: A hardened gold plating liquid comprises gold cyanide, cyanide salt, cobalt salt, nitro containing compound, and the compound more than 1 or 2 selected from the group composed of carboxyclic acid, oxy carboxyclic acid and their salts. The concentration of the nitro containing compound is 0.1~20g / L. The plating leakage can be prevented by controlling the electric current density by adjusting the thickness of a gold film of a Ni barrier part(14) less than 0.01μm.
申请公布号 KR20110006589(A) 申请公布日期 2011.01.20
申请号 KR20100043945 申请日期 2010.05.11
申请人 N.E. CHEMCAT CORPORATION 发明人 FURUKAWA MASATO;SON, IN JOON
分类号 C25D3/48;C25D5/02;C25D7/00 主分类号 C25D3/48
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