| 摘要 |
PROBLEM TO BE SOLVED: To provide management method of an etching liquid, by which a removal defect of a transparent conductive film caused by overlooking a time point for supplement or exchange of the etching liquid is not generated when a dummy substrate is subjected to acid treatment in regeneration of a color filter or dummy substrate; and to provide a glass substrate-regenerating device.SOLUTION: In the management method of the etching liquid, film thickness of the transparent conductive film 3 of the color filter or the dummy substrate is continuously measured to calculate accumulated total film thickness; and when the accumulated total film thickness reaches a predetermined accumulated total film thickness (1), the etching liquid is supplemented or exchanged. The glass substrate-regenerating device includes a management mechanism 10 of the etching liquid based on the management method. |
