| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a light-emitting device capable of preventing light extraction efficiency from being degraded while securing an excellent bondability by subjecting a p-clad layer located on a surface layer to wet etching according to a mask pattern, and to provide a light-emitting device.SOLUTION: In this light-emitting device 1, an n clad layer 3, an active layer 4 and a first p-clad layer 5 are laminated on a substrate 2, and a second p-clad layer 6 lower in oxidation nature and lower in conductivity than the first p-clad layer 5 is further laminated. Next, a rough surface R is formed on the surface of the second p-clad layer 6. The center part of the second p-clad layer 6 is removed by wet etching by a mask pattern in accordance with the outline of a p electrode 8 to expose the first p-clad layer 5. Finally, the p electrode 8 is formed on the part with the first p-clad layer 5 exposed therefrom. Since the rough surface R is formed on the surface of the second p-clad layer 6, the degree of progress in etching can be kept generally the same, and mask pattern-based etching is possible. |
