发明名称
摘要 <p>The present invention relates to a method and a system for manufacturing wafer-like slices from a body of a substrate material, especially for use in the manufacture of semiconductor devices. The method comprises providing a slicing device with a cutting wire equipped on its surface with abrasive particles; providing an aqueous cooling and lubricating fluid, said fluid having an ionic strength corresponding to an electrical conductivity of about 30 IJS/cm or less; cutting said body with said cutting wire into slices while dispensing said cooling and lubricating fluid into a kerf area where said cutting wire contacts and cuts said body, said cooling and lubricating fluid promoting removal of powdered substrate material from said kerf area resulting in spent fluid; and removing said spent fluid from said cutting device and recovering said powdered substrate material from said spent fluid.</p>
申请公布号 JP2011502346(A) 申请公布日期 2011.01.20
申请号 JP20100530279 申请日期 2007.10.30
申请人 发明人
分类号 H01L21/304;B23Q11/00;B23Q11/10;B24B27/06;B24B55/03;B28D7/02;C10M105/18;C10M107/34;C10M125/26;C10N30/00;C10N40/22 主分类号 H01L21/304
代理机构 代理人
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