发明名称 Layout design system and layout design method
摘要 In a layout design of a semiconductor circuit, by selecting a frequently-used layout cell based on a layout design, a common location (coordinate) at which dummy metal is arranged is specified. A new layout cell in which dummy metal is arranged in advance at the specified arrangement location is generated. Dummy metal is arranged by replacing the frequently-used layout cell from which the new layout cell is generated by the new layout cell having dummy metal or by overlapping them. Thus, process such as wiring correction in which the amount of data depends on processing speed can be carried out by use of the inexpensive computer having low throughputs and the small amount of memory.
申请公布号 US2011016445(A1) 申请公布日期 2011.01.20
申请号 US20100801864 申请日期 2010.06.29
申请人 NEC ELECTRONICS CORPORATION 发明人 UEDA MAKOTO
分类号 G06F17/50 主分类号 G06F17/50
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