| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode plate for a plasma processing apparatus, that can improve in-plane uniformity of plasma processing by reducing a temperature difference between a center part and an outer peripheral part of the electrode plate.SOLUTION: A plurality of gas passage holes 11 penetrating the electrode plate along its thickness are formed, and groove-shaped or spot-shaped recessed parts 21A to 21F are formed dispersedly in an in-plane direction of a back of the electrode plate while avoiding those gas passage holes 11, the occupation volume of the recessed parts 21A to 21F per unit volume of the electrode plate 3 being larger at the outer peripheral part of the electrode plate 3 than at the center part. |
