| 摘要 |
PROBLEM TO BE SOLVED: To obtain a method for manufacturing a piezoelectric thin film that uses a rinsing liquid without limits and removing toxicity to human bodies or environmental load, while preventing increase in film thickness, at an outer circumferential portion and liquid dripping.SOLUTION: In this manufacturing method, since acetic acid plays a role as a solvent and has proper affinity with water, precipitation hardly occurs, even if water is mixed with a colloid solution 71, and in rinsing to remove the colloid solution 71 applied to an outer circumferential portion 105 with water, after applying the colloid solution 71 on a substrate 101; and the outer circumferential portion 105 can be prevented from having a large thickness and liquid dripping. Accordingly, a rinsing process (S3) can be executed, by using water without limits for removing toxicity to human bodies and environmental load, thereby obtaining the method for manufacturing the piezoelectric thin film 70, by using the rinsing liquid without limit; removing toxicity to human bodies and environmental load, while preventing increase in the afilm thickness, at an outer circumferential pportion 105 and liquid dripping. |
