| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample holding device and a charged particle beam apparatus, capable of restraining effectively a sample from being deformed when moving the sample, even in a wafer as a sample deformed with its part floated.SOLUTION: This sample holding device provided with a plurality of support blocks for supporting the sample at the first height includes a contact body with a tip positioned at the second height higher than the first height, under the condition where the sample is not arranged, a guide for supporting vertically movably the contact body, and a pressing member for pressing the contact body vertically when the tip of the contact body supported by the guide moves to a lower side lower than the second height. The charged particle beam apparatus is equipped the sample holding device. |
