发明名称 |
LAMINATE AND PROCESS FOR PRODUCTION THEREOF |
摘要 |
<p>A laminate comprising a base material and a silicon-containing film formed on the base material, wherein the silicon-containing film has a nitrogen-rich region composed of a silicon atom and a nitrogen atom or a silicon atom, a nitrogen atom and an oxygen atom, and wherein the nitrogen-rich region is formed by irradiating a polysilazane film that has been formed on the base material with an energy ray in an atmosphere where oxygen or water vapor is not contained substantially to thereby modify at least a part of the film; and a process for producing the laminate.</p> |
申请公布号 |
WO2011007543(A1) |
申请公布日期 |
2011.01.20 |
申请号 |
WO2010JP04510 |
申请日期 |
2010.07.12 |
申请人 |
MITSUI CHEMICALS, INC.;TAKAKI, TOSHIHIKO;FUKUMOTO, HARUHIKO |
发明人 |
TAKAKI, TOSHIHIKO;FUKUMOTO, HARUHIKO |
分类号 |
B32B9/00;B32B27/00 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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