发明名称 |
NON-COVALENTLY CROSSLINKABLE MATERIALS FOR PHOTOLITHOGRAPHY PROCESSES |
摘要 |
This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks. |
申请公布号 |
EP2174189(A4) |
申请公布日期 |
2011.01.19 |
申请号 |
EP20080796726 |
申请日期 |
2008.07.28 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
SULLIVAN, DANIEL, M.;HUANG, RUNHUI;NEEF, CHARLES, J.;DAI, JINHUA;SWOPE, MICHAEL, B. |
分类号 |
G03F7/11;C08F212/04;C08F220/10;C08F236/06;G03F7/16 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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