Electron beam vapor deposition apparatus and method of coating

摘要

An electron beam vapor deposition apparatus (10) includes a coating chamber (14) including a coating zone for depositing a coating on a work piece (12). A coating device (30) includes at least one crucible (32) for presenting at least one source coating material (34). The coating device (30) includes a first deposition mode of depositing the at least one source coating material (34) and a second deposition mode of depositing the at least one source coating material (34). At least one electron beam source (20) evaporates the at least one source coating material (34) for deposit onto the work piece (12). A controller (36) is configured to control a speed of movement of the work piece (12) in the coating zone (26) during the coating operation in response to the first deposition mode and the second deposition mode.